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Thin film growth: Physics, materials science and applicationsEdited by Z Cao, Chinese Academy of Sciences, China
Woodhead Publishing Series in Electronic and Optical Materials No. 20
- provides an important and up-to-date review of the theory and deposition techniques used in the formation of thin films
- focusses on the theory and modelling of thin film growth, techniques and mechanisms used for thin film growth and properties of thin films
- an essential reference for engineers in electronics, energy materials and mechanical engineering
Thin film technology is used in many applications such as microelectronics, optics, hard and corrosion resistant coatings and micromechanics, and thin films form a uniquely versatile material base for the development of novel technologies within these industries. Thin film growth provides an important and up-to-date review of the theory and deposition techniques used in the formation of thin films.
Part one focuses on the theory of thin film growth, with chapters covering nucleation and growth processes in thin films, phase-field modelling of thin film growth and surface roughness evolution. Part two covers some of the techniques used for thin film growth, including oblique angle deposition, reactive magnetron sputtering and epitaxial growth of graphene films on single crystal metal surfaces. This section also includes chapters on the properties of thin films, covering topics such as substrate plasticity and buckling of thin films, polarity control, nanostructure growth dynamics and network behaviour in thin films.
With its distinguished editor and international team of contributors, Thin film growth is an essential reference for engineers in electronics, energy materials and mechanical engineering, as well as those with an academic research interest in the topic.
ISBN 1 84569 736 7
ISBN-13: 978 1 84569 736 5
July 2011
432 pages 234 x 156mm hardback
£145.00 / US$245.00 / €175.00
Usually dispatched within 24 hours
About the editor
Zexian Cao is a Professor at the Institute of Physics of the Chinese Academy of Sciences in Beijing, China.
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Contents
PART 1 THEORY OF THIN FILM GROWTH
PART 2 TECHNIQUES OF THIN FILM GROWTH
PART 1 THEORY OF THIN FILM GROWTH
Measuring nucleation and growth processes in thin films
Y Homma, Tokyo University of Science, Japan
- Introduction
- Basic theory of epitaxial growth
- Observation method of atomic steps
- Two-dimensional-island nucleation and step-flow growth modes
- The motion of atomic steps on a growing and evaporating Si(111) surface
- Morphological instability of atomic steps
- Conclusion and future trends
- References
- Appendix
Quantum electronic stability of atomically uniform films
T Miller and T-C Chiang, University of Illinois at Urbana-Champaign, USA
Introduction
- Electronic growth
- Angle-resolved photoemission spectroscopy
- Atomically uniform films
- Quantum thermal stability of thin films
- General principles of film stability and nanostructure development
- Beyond the particle-in-a-box
- Future trends
- Acknowledgements
- References
Phase-field modelling of thin film growth
A Voigt, Technische Universität Dresden, Germany
- Introduction
- Modeling
- Numerical results
- Conclusion
- References
Analysing surface roughness evolution in thin films
Y Kajikawa, The University of Tokyo, Japan
- Introduction
- Roughness during homo-epitaxial growth
- Roughness during hetero- or non-epitaxial growth
- Future trends
- References
Modelling thin film deposition processes based on real-time observation
S Kowarik, Humboldt Universität zu Berlin and A Hinderhofer, A Gerlach and F Schreiber, Universität Tübingen, Germany
- Introduction: time resolved surface science
- Basics of growth and relevant length- and timescales for in-situ observation of film deposition
- Experimental techniques for real-time and in-situ studies
- Experimental case studies
- Future trends
- Sources of further information and advice
- References
PART 2 TECHNIQUES OF THIN FILM GROWTH
Silicon nanostructured films grown on templated surfaces by the oblique angle deposition
D Ye and T-M Lu, Rensselaer Polytechnic Institute, USA
- Introduction
- Preparation of templated surface for oblique angle deposition
- Fan-out on template surface with normal incident flux
- Fan-out growth on templated surfaces with oblique angle incident flux
- Control of fan-out growth with substrate rotations
- Applications and future trends
- References
Phase transitions in colloidal crystal thin films
F Ramiro-Manzano, E Bonet, I Rodríguez and F Meseguer, Universidad Politécnica de Valencia, Spain
- Introduction
- Experimental tools
- Description of colloidal crystal phases: historical survey
- Phase transition sequence in colloidal crystal thin films
- Conclusions and future trends
- Acknowledgements
- References
- Appendix: list of symbols
Thin film growth for thermally unstable noble-metal nitrides by reactive magnetron sputtering
Z Cao, Chinese Academy of Sciences, PR China
- Introduction
- Deposition of stoichometric Cu3N
- Nitrogen reemission
- Doping of Cu3N by Co-sputtering
- Conclusions
- References
Growth of graphene layers for thin films
B H Hong and H R Jeon, Sungkyungkwan University, South Korea
- Introduction
- Large-scale pattern growth of graphene films for stretchable transparent electrodes
- Roll-to-roll production of 30-inch graphene films for transparent electrodes
- Conclusions
- References
Epitaxial growth of graphene thin films on single crystal metal surfaces
J Coraux, Institut Néel, France and A T N’Diaye, B Carsten and T Michely, Universität zu Köln, Germany
- Introduction
- Structure of graphene on metals
- Growth of graphene on a metal
- Future trends
- Sources of further information and advice
- Acknowledgements
- References
Electronic properties and adsorption behaviour of thin films with polar character
N Nilius, Fritz-Haber-Institut der MPG, Germany
- Introduction to oxide polarity
- Polar oxide films
- Measuring polarity of thin oxide films
- Adsorption properties of polar films
- Conclusion and future trends
- Sources of further information and advice
- Acknowledgements
- References
Polarity controlled epitaxy of III-nitrides and ZnO by molecular beam epitaxy
X Q Wang, Peking University, PR China and A Yoshikawa, Chiba University, Japan
- Introduction
- Lattice polarity and detection methods
- Polarity issues at heteroepitaxy and homoepitaxy
- Polarity controlled epitaxy of GaH and AlN
- Polarity controlled epitaxy of InN
- Polarity controlled epitaxy of ZnO
- Conclusions
- References
Understanding substrate plasticity and buckling of thin films
F Foucher, Centre de Biophysique Moléculaire - CNRS and C Coupeau, J Colin, A Cimetière and J Grilhé, Université de Poitiers, France
- Introduction
- Experimental observations
- Modelling
- Discussion
- Conclusions
- References
Controlled buckling of thin films on compliant substrates for stretchable electronics
J Song, University of Miami and J Wu and Y Huang, Northwestern University, USA
- Introduction
- Mechanics of one-dimensional non-coplanar mesh design
- Mechanics of two-dimensional non-coplanar mesh design
- Conclusions
- References
The electrocaloric effect (ECE) in ferroelectric polymer films
S-G Lu and Q M Zhang, The Pennsylvania State University, USA and Z Kutnjak, Jozef Stefan Institute, Slovenia
- Introduction
- Thermodynamic considerations on materials with large electrocaloric effect (ECE)
- Previous investigations on ECE in polar materials
- Large ECE in ferroelectric polymer films
- Future trends
- Conclusion
- Acknowledgements
- References
Network behavior in thin films and nanostructure growth dynamics
H Guclu, University of Pittsburgh, T Karabacak, University of Arkansas at Little Rock and M Yuksel, University of Nevada – Reno, USA
- Introduction
- Origins of network behaviour during thin film growth
- Monte Carlo simulations
- Results and discussion
- Conclusions
- References